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MT 545 Plasma Processing

Basic plasma physics; some atomic processes; and plasma diagnostics. Plasma production; DC glow discharges and RF glow discharges; magnetron discharges. Plasma-surface interaction; sputter deposition of thin films; reactive ion etching, ion milling, and texturing; electron beam-assisted chemical vapor deposition; and ion implantation. Sputtering systems; ion sources; electron sources; and ion beam handling.

Credits

3

Cross Listed Courses

PEP 545

Prerequisite

Graduate Student or At Least Junior

Distribution

Department of Physics Materials Science and Engineering Program