MT 545 Plasma Processing
Basic plasma physics; some atomic processes; and plasma diagnostics. Plasma production; DC glow discharges and RF glow discharges; magnetron discharges. Plasma-surface interaction; sputter deposition of thin films; reactive ion etching, ion milling, and texturing; electron beam-assisted chemical vapor deposition; and ion implantation. Sputtering systems; ion sources; electron sources; and ion beam handling.
Cross Listed Courses
PEP 545
Prerequisite
Graduate Student or At Least Junior
Distribution
Department of Physics
Materials Science and Engineering Program